Part 3 of 3: Trends in advanced IC Packaging | Electronics Advocate

Part 3 of 3: Trends in advanced IC Packaging

Wednesday, February 24, 2010
By John H. Lau, Cheng Kuo Lee, C. S. Premachandran, Yu Aibin

Here’s a book excerpt from “Advanced MEMS Packaging,” written by experts in the field. The book details the latest cutting-edge microelectromechanical systems (MEMS) packaging techniques such as low-temperature bonding and 3-D packaging. It can certainly serve as a valuable reference for those faced with the challenging problems created by MEMS devices and packaging. Part 3 covers advanced MEMS packaging. 2.3 Advanced MEMS Packaging Advanced MEMS packaging usually involves at least three wafers, namely, the MEMS device wafer, the ASIC wafer, and the cavity-cap wafer. This section examines the design and processing of 10 different configurations of 3D MEMS packaging.53 These packages are supposed to yield very low-cost, high-performance packaging with a small footprint.

FIGURE 2-31 Nine different designs of 3D MEMS packaging for the MEMS wafer, ASIC wafer, and cavity-cap wafer.

FIGURE 2-31 Nine different designs of 3D MEMS packaging for the MEMS wafer, ASIC wafer, and cavity-cap wafer.

2.3.1 3D MEMS WLP: Designs and Materials Figure 2-31 shows nine different combinations (designs) of 3D MEMS packaging from the MEMS wafer (with either wire-bonding pads, solder-bumped TSV substrate, or solder-bumped flip-chip without TSV), the ASIC wafer (with or without TSV), and the cavity-cap wafer (with or without TSV).53 Case 1: The MEMS device is die attached and then wire bonded on the ASIC chip or wafer. The cavity-cap chip/wafer is attached to the ASIC chip/wafer with a sealing ring, as shown in Fig. 2-32.
FIGURE 2-32 All wire-bonding 3D MEMS packaging with lateral electrical feedthrough.

FIGURE 2-32 All wire-bonding 3D MEMS packaging with lateral electrical feedthrough.

FIGURE 2-33 Solder-bumped MEMS device with TSV substrate on an ASIC chip with lateral electrical feed-through.

FIGURE 2-33 Solder-bumped MEMS device with TSV substrate on an ASIC chip with lateral electrical feed-through.

The signal lines go through beneath the sealing ring to the wirebonding pad on the ASIC chip periphery. Another set of wirebonding pads connects the MEMS/ASIC 3D stack to either a substrate in a package or on a PCB. Case 2: The micro-solder-bumped MEMS device with a TSV substrate is first attached to the ASIC, as shown in Fig. 2-33. The rest is the same as in case 1. Case 3: The solder-bumped flip-chip MEMS device is first attached on the ASIC, as shown in Fig. 2-34. The rest is the same as in case 1. Case 4: The MEMS device is die attached and wire bonded on the ASIC chip with TSV and ordinary solder bumps, as shown in Fig. 2-35. A cavity cap is attached on the ASIC with a sealing ring. The MEMS/ASIC 3D stack is then attached (solder refl owed) to a substrate in a package or on a PCB.
FIGURE 2-34 Solder-bumped flip-chip MEMS device on an ASIC chip with lateral electrical feed-through.

FIGURE 2-34 Solder-bumped flip-chip MEMS device on an ASIC chip with lateral electrical feed-through.

FIGURE 2.35 MEMS device wire bonded on an ASIC chip with vertical electrical feed-through TSV.

FIGURE 2.35 MEMS device wire bonded on an ASIC chip with vertical electrical feed-through TSV.

FIGURE 2.36 TSV MEMS device solder bonded on an ASIC chip with vertical electrical feed-through TSV.

FIGURE 2.36 TSV MEMS device solder bonded on an ASIC chip with vertical electrical feed-through TSV.

Case 5: The micro-solder-bumped MEMS device with a TSV substrate is first attached to the ASIC chip with TSV and ordinary solder bumps, as shown in Fig. 2-36. The rest is the same as in case 4. Case 6: The solder-bumped MEMS device is first attached to the TSV ASIC with ordinary solder bumps, as shown in Fig. 2-37. The rest is the same as in case 5. Case 7: The MEMS device is die attached and then wire bonded on the ASIC. The cavity cap with TSV and ordinary solder bumps is attached to the ASIC with a sealing ring, as shown in Fig. 2-38. Then the whole 3D carrier is attached (solder refl owed) to a substrate in a package or on a PCB. Case 8: The micro-solder-bumped MEMS device with TSV substrate is first attached to the ASIC as shown in Fig. 2-39. The rest is the same as in case 7.
FIGURE 2-37 Solder-bumped MEMS device flip-chip on an ASIC chip with vertical electrical feed-through TSV.

FIGURE 2-37 Solder-bumped MEMS device flip-chip on an ASIC chip with vertical electrical feed-through TSV.

FIGURE 2-38 MEMS device wire bonded on an ASIC chip (vertical electrical feed-through TSV is in the package cap).

FIGURE 2-38 MEMS device wire bonded on an ASIC chip (vertical electrical feed-through TSV is in the package cap).

FIGURE 2-39 TSV MEMS device solder bonded on an ASIC chip (vertical electrical feed-through TSV is in the package cap).

FIGURE 2-39 TSV MEMS device solder bonded on an ASIC chip (vertical electrical feed-through TSV is in the package cap).

Case 9: The solder-bumped MEMS device is first attached to the ASIC as shown in Fig. 2-40. The rest is the same as in case 7. Case 10: The MEMS device is attached to the ordinary solder bumped TSV ASIC with a sealing ring, as shown in Fig. 2-41. Then the whole 3D stack is attached (solder reflowed) to a substrate in a package or on a PCB.
FIGURE 2-40 Solder-bumped MEMS device flip-chip on an ASIC chip (vertical electrical feed-through TSV is in the package cap).

FIGURE 2-40 Solder-bumped MEMS device flip-chip on an ASIC chip (vertical electrical feed-through TSV is in the package cap).

FIGURE 2-41 MEMS device is bonded (with a sealing ring) on an ASIC chip with vertical electrical feed-through TSV.

FIGURE 2-41 MEMS device is bonded (with a sealing ring) on an ASIC chip with vertical electrical feed-through TSV.

2.3.2 3D MEMS WLP: Processes There are many different processes to assemble these 10 MEMS SiPs. For example, the assembly process shown in Fig. 2-42 can be applied to cases 1 through 3; Fig. 2-43, to cases 4 to 6; and Fig. 2-44, to cases 7 to 9.53 Case 10 will be discussed later. As mentioned earlier, the MEMS wafer can be fabricated either with wire-bonding pads or TSV and solder bumps or a solder-bumped flip-chip, as shown in Figs. 2-42 through 2-44. These are followed by releasing (etching) the MEMS wafer and singulation. For 3D MEMS packaging with lateral electrical feed-through (cases 1, 2, and 3), there is no TSV in both the ASIC and cap wafers (see Fig. 2-42). In these cases, cavities should be formed in the cap wafer by either KOH etching or use of a laser. Then one performs the bonding of the MEMS device (chip) to the ASIC wafer (C2W). This will be followed by bonding of the cavity-cap wafer to the ASIC wafer (W2W). Finally, the bonded wafers are singulated into individual units, which are ready to be wire bonded on the substrate of a package or on a PCB, as shown in Fig. 2-45. For both cases, encapsulant is recommended.
FIGURE 2-42 Assembly process for 3D MEMS packaging with lateral electrical feedthrough.

FIGURE 2-42 Assembly process for 3D MEMS packaging with lateral electrical feedthrough.

FIGURE 2-43 Assembly process for 3D MEMS packaging with vertical electrical feed-through the TSV in an ASIC chip.

FIGURE 2-43 Assembly process for 3D MEMS packaging with vertical electrical feed-through the TSV in an ASIC chip.

FIGURE 2-44 Assembly process for 3D MEMS packaging with vertical electrical feed-through the TSV in the package cap.

FIGURE 2-44 Assembly process for 3D MEMS packaging with vertical electrical feed-through the TSV in the package cap.

For 3D MEMS packaging with vertical electrical feed-through in the ASIC chip (cases 4, 5, and 6), the TSV must be fabricated on the ASIC wafer before C2W bonding, as shown in Fig. 2-43. After the W2W (cap-to-ASIC) bonding, wafer bumping should be performed on the bottom side of the ASIC wafer. After singulations, the individual units can be soldered on the substrate of either a package or a PCB, as shown in Fig. 2-46. For the PCB case, underfill is necessary for the reliability of the solder joints. For the solder-bumped flip-chip-in-package case, use of underfill depends on the substrate material. If it is made of ceramic, then underfill is optional. However, if it is an organic substrate, then underfill is a must. For 3D MEMS packaging with vertical electrical feed-through in the package cap (cases 7, 8, and 9), the TSV and cavity must be fabricated on the cap wafer before W2W bonding, as shown in Fig. 2-44. After W2W bonding, wafer bumping should be performed on the bottom side of the cap wafer. The rest is the same as in cases 4 through 6, and Fig. 2-47 shows an example of the complete 3D MEMS packaging with vertical electrical feed-through in the package cap.
FIGURE 2-45 Complete 3D MEMS packaging with lateral electrical feed-through (encapsulants are recommended).

FIGURE 2-45 Complete 3D MEMS packaging with lateral electrical feed-through (encapsulants are recommended).

FIGURE 2-46 Complete 3D MEMS packaging with vertical electrical feed-through in the TSV of a ASIC chip (underfi lls are recommended).

FIGURE 2-46 Complete 3D MEMS packaging with vertical electrical feed-through in the TSV of a ASIC chip (underfi lls are recommended).

FIGURE 2-47 Complete 3D MEMS packaging with vertical electrical feed-through the TSV of the package cap (underfi lls are recommended).

FIGURE 2-47 Complete 3D MEMS packaging with vertical electrical feed-through the TSV of the package cap (underfi lls are recommended).

In the food chain of electronic products, packaging is a downstream process (i.e., the packaging people cannot be or are not in a proactive position and cannot say too much), and the packaging people just package whatever is given them by the semiconductor people (i.e., our job starts from the wafers). Case 10 (see Fig. 2-41) is a very low-cost, high-performance 3D MEMS package.53 However, in order to make it, the MEMS device (chip) must be much larger (to make space for the sealing ring) than that packages in cases 1 through 9 with a cavity cap. Thus, from a semiconductor points of view, this is a very bad idea because many fewer MEMS devices can be produced on the same size MEMS wafer. Editor’s notes:Part 1 of 3: Trends in advanced IC packagingPart 2 of 3: Trends in advanced IC packaging — Click here for additional information about the book or to purchase. Excerpted from Advanced MEMS Packaging by John Lau, et al (McGraw-Hill; 2009) with permission from McGraw-Hill. References: 1. Andry, P. S., Tsang, C. K., Webb, B. C., Sprogis, E. J., Wright, S. L., Bang, B., and Manzer, D. G. “Fabrication and characterization of robust through-silicon vias for silicon-carrier applications.” IBM Journal of Research and Development 52:571–581, 2008. 2. Knickerbocker, J. U., Andry, P.S., Dang, B., Horton, R. R., Patel, C. S., Polastre, R. J., Sakuma, K., Sprogis, E. S., Tsang, C. K., Webb, B. C., and Wright, S. L. “3-D silicon integration.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 2008, pp. 538–543. 3. Kumagai, K., Yoneda, Y., Izumino, H., Shimojo, H., Sunohara, M., and Kurihara, T. “A silicon interposer BGA package with Cu-filled TSV and multilayer Cu plating interconnection.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 2008, pp. 571–576. 4. Sunohara, M., Tokunaga, T., Kurihara, T., and Higashi, M., “Silicon interposer with TSVs (through-silicon vias) and fine multilayer wiring.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 2008, pp. 847–852. 5. Lee, H. S., Choi, Y.-S., Song, E., Choi, K., Cho, T., and Kang, S. “Power delivery network design for 3D SIP integrated over silicon interposer platform.” In IEEE Proceedings of Electronic Components and Technology Conference, Reno, NV, May 2007, pp. 1193–1198. 6. Matsuo, M., Hayasaka, N., and Okumura, K. “Silicon interposer technology for high-density package.” In IEEE Proceedings of Electronic Components and Technology Conference, Las Vegas, NV, May 2000, pp. 1455–1459. 7. Selvanayagam, C., Lau, J. H., Zhang, X., Seah, S., Vaidyanathan, K., and Chai, T. “Nonlinear thermal stress/strain analysis of copper filled TSV (through silicon via) and their flip-chip microbumps.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 2008, pp. 1073–1081. 8. Wong, E., Minz, J., and Lim, S. K. “Effective thermal via and decoupling capacitor insertion for 3D system-on-package.” In IEEE Proceedings of Electronic Components and Technology Conference, San Siego, CA, May 2006, pp. 1795–1801. 9. Khan, N., Rao, V., Lim, S., Ho, S., Lee, V., Zhang, X., Yang, R., Liao, E., Ranganathan, N., Chai, T., Kripesh, V., and Lau, J. H. “Development of 3D silicon module with TSV for system in packaging.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 27–30, 2008, pp. 550–555. 10. Ho, S., Yoon, S., Zhou, Q., Pasad, K., Kripesh, V., and Lau, J. H. “High rf performance TSV for silicon carrier for high frequency application.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 27–30, 2008, pp. 1956–1952. 11. Premachandran, C., Rangnathan, N., Mohanraj, S., Chong Ser Choong, and Iyer, M. K. “A vertical wafer level packaging using through hole filled via interconnect by lift off polymer method for MEMS and 3D stacking applications.” In Proceedings of the Fifty-first Electronic Components and Technology Conference, Lake Buena Vista, FL, 2005, pp. 1094–1098. 12. Chen, K. S., Ayon, A. A., Zhang, X., and Spearing, S. M. “Effect of process parameters on the surface morphology and mechanical performance of silicon surfaces after deep reactive ion etching (DRIE).” J. Microelectromech. Syst. 11:264–275, 2002. 13. Zhang, X., Chai, T., Lau, J. H., Selvanayagam, C., Biswas, K., Liu, S., Pinjala, D., Tang, G., Ong, Y., Vempati, S., Wai, E., Li, H., Liao, B., Ranganathan, N., Kripesh, V., Sun, J., Doricko, J., and Vath, C. “Development of through silicon via (TSV) interposer technology for large die (21 ??21 mm) fine-pitch Cu/low-k FCBGA package.” IEEE Proceedings of Electronic Components and Technology Conference, San Diego, CA, May 2009, pp. 305–312. 14. Hu, G., Kalyanam, H., Krishnamoorthy, S., and Polka, L. “Package technology to address the memory bandwidth challenge for tera-scale computing.” INTEL Technol. J. 11:197–206, 2007. 15. Knickerbocker, J. U., Andry, P. S., Buchwalter, L. P., Deutsch, A., Horton, R. R., Jenkins, K. A., Kwark,Y. H., McVicker, G., Patel, C. S., Polastre, R. J., Schuster, C., Sharma, A., Sri-Jayantha, S. M., Surovic, C. W., Tsang, C. K., Webb, B. C., Wright, S. L., McKnight, S. R., Sprogis, E. J., and Dang, B. “Development of next-gereration system-on-package (SOP) technology based on silicon carriers with fine-pitch interconnection.” IBM J. Res. Dev. 49:725–754, 2005. 16. Tomita, Y., Morifuji, T., Ando, T., Tago, M., Kajiwara, R., Nemoto, Y., Fujii, T., Kitayama, Y., and Takahashi, K. “Advanced packaging technologies on 3D stacked LSI utilizing the micro interconnections and the layered microthin encapsulation.” In Proceedings of the Fifty-first Electronic Components and Technology Conference, Orlando, FL, 2001, pp. 353–360. 17. Choi, W. K., Premachandran, C., Ong, C., Ling, X., Liao, E., Khairyanto, A., Chne, K., Thaw, P., and Lau, J. H. “Development of novel intermetallic jointsusing thin film indium based solder by low temperature bonding technology for 3D IC stacking.” IEEE Proceedings of Electronic Components and Technology Conference, San Diego, CA, May 2009, pp. 333–338. 18. Takahashi, K., Umemoto, M., Tanaka, N., Tanida, K., Nemoto, Y., Tomita, Y., Tage, M., and Bonkohara, M. “Ultra-high-density interconnection technology of three-dimensional packaging.” Microelectronics Reliability 43:1267–1279, 2003. 19. Lau, J. H., Lim, Y., Lim, T., Tang, G., Khong, C., Zhang, X., Ramana, P., Zhang, J., Tani, C., Chandrappan, J., Chai, J., Li, J., Tangdiongga, G., and Kwong, D. “Design and analysis of 3D stacked optoelectronics on optical printed circuit boards.” In Proceedings of SPIE, Photonics Packaging, Integration, and Interconnects VIII, San Jose, CA, January 19–24, 2008, Vol. 6899, pp. 07.1–07.20. 20. Lau, J. H., and Tang, G. “Thermal management of 3D IC integration with TSV (through silicon via).” IEEE Proceedings of Electronic Components and Technology Conference, San Diego, CA, May 2009, pp. 635–640. 21. Yu, A., Kumar, A., Ho, S., Wai, H., Lau, J. H., Khong, C., Lim, S., Zhang, X., Yu , D., Su, N., Chew, M., Ching, J., Tan, T., Kripesh, V., Lee, C., Huang, J., Chiang, J., Chen, S., Chiu, C., Chan, C., Chang, C., Huang, C., and Hsiao, C., “Development of fine pitch solder microbumps for 3D chip stacking.” IEEE Proceedings of Electronic Packaging and Technology Conference, Singapore,December 2008, pp. 387–392. 22. Yu, A., Lau, J. H., Ho, S., Kumar, A., Wai, Y., Yu, D., Jong, M., Kripesh, V., Pinjala, D., Kwong, D., “Study of 15-?m-pitch solder microbumps for 3D IC integration.” IEEE Proceedings of Electronic Components and Technology Conference, San Diego, CA, May 2009, pp. 6 –10. 23. Yu, A., Lau, J. H., Ho, S., Kumar, A., Yin, H., Ching, J., Kripesh, V., Pinjala, D., Chen, S., Chan, C., Chao, C., Chiu, C., Huang, M., and Chen, C., “Three dimensional interconnects with high aspect ratio TSVs and fine pitch solder microbumps.” IEEE Proceedings of Electronic Components and Technology Conference, San Diego, CA, May 2009, pp. 350–354. 24. Yu, A., Khan, N., Archit, G., Pinjala1, D., Toh, K., Kripesh1, V., Yoon, S., and Lau, J. H. “Development of silicon carriers with embedded thermal solutions for high power 3D package.” IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 27–30, 2008, pp. 24–28. 25. Rebeiz, G. M. RF MEMS: Theory, Design and Technology. New York: Wiley, 2003. 26. Nguyen, C. “MEMS technology for timing and frequency control.” IEEE Trans. Ultrason. Ferroelect. Freq. Contr. 54:251–270, 2007. 27. Mohamed Gad-el-Hak. The Mems Handbook. Boca Raton, FL: CRC Press, 2002. 28. Hacker, J. B., Mihailovich, R. E., Kim, M., and DeNatale, J. F. “A Ka-band 3-bit rf MEMS true-time-delay network.” IEEE Trans. Microw. Theory Tech. 51:305–308, 2003. 29. Anagnostou, D. E., Zheng, G., Chryssomallis, M., Lyke, J., Ponchak, G., Papapolymerou, J., and Christodoulou, C. G. “Design, fabrication and measurements of a self-similar re-configurable antenna with rf-MEMS switches.” IEEE Transactions on Antennas Propagat. 54:422–432, 2006. 30. Liu, A. Q., and Zhang, X. M. “A review of MEMS external-cavity tunable lasers.” J. Micromech. Microeng. 17:R1–R13, 2007. 31. Huff, G. H., and Bernhard, J. T. “Integration of packaged rf MEMS switches with radiation pattern reconfigurable square spiral microstrip antennas.” IEEE Trans. Antennas Propagat. 54:464–469, 2006. 32. Van Caekenberghe, K., and Sarabandi, K. “A 2-bit Ka-band rf MEMS frequency tunable slot antenna.” IEEE Antennas and Wireless Propagat. Lett. 7:179–182, 2008. 33. Nguyen, C. “MEMS technology for timing and frequency control,” IEEE Trans. Ultrason. Ferroelect. Freq. Contr. 54:251–270, 2007. 34. Tan, G. L., Mihailovich, R. E., Hacker, J. B., DeNatale, J. F., and Rebeiz, G. M. “Low-loss 2- and 4-bit TTD MEMS phase shifters based on SP4T switches.” IEEE Trans. Microwave Theory Tech. 51:297–304, 2003. 35. Hacker, J. B., Mihailovich, R. E., Kim, M., and DeNatale, J. F. “A Ka-band 3-bit rf MEMS true-time-delay network.” IEEE Trans. Microwave Theory Tech. 51:305–308, 2003. 36. Ford, J. E., Goossen, K. W. , Walker, J. A., Neilson, D. T., Tennant, D. M., Park, S. Y., and Sulhoff, J. W. “Interference-based micromechanical spectral equalizers.” IEEE J. Select. Topics Quantum Elect. 10:579–587, 2004. 37. Nordquist, C. D., Dyck, C. W., Kraus, G. M., Reines, I. C., Goldsmith, C. L., Cowan, W. D., Plut, T. A., Austin, F., Finnegan, P. S., Ballance, M. H., and Sullivan, C. T. “A dc to 10 GHz 6-BIT RF MEMS time delay circuit.” IEEE Microwave Wireless Component Lett. 16:305–307, 2006. 38. Perruisseau-Carrier, J., Fritschi, R., Crespo-Valero, P., and Skrivervik, A. K. “Modeling of periodic distributed MEMS application to the design of variable true-time-delay lines.” In IEEE Trans. Microwave Theory Tech. 54:383–392, 2006. 39. Lakshminarayanan, B., and Weller, T. M., “Design and modeling of 4-bit slowwave MEMS phase shifters.” IEEE Trans. Microwave Theory Tech. 54:120–127, 2006. 40. Lakshminarayanan, B., and Weller, T. M. “Optimization and implementation of impedance-matched true-time-delay phase shifters on quartz substrate.” IEEE Trans. Microwave Theory Tech. 55:335–342, 2007. 41. Van Caekenberghe, K., and Vaha-Heikkila, T. “An analog rf MEMS slotline true-time-delay phase shifter.” IEEE Trans. Microwave Theory Tech. 56: 2008. 42. Maciel, J. J., Slocum, J. F., Smith, J. K., and Turtle, J. “MEMS electronically steerable antennas for fire control radars.” IEEE Aerosp. Electron. Syst. Mgnt., November 2007, pp. 17–20. 43. Pranonsatit, S., Holmes, A. S., Robertson, I. D., and Lucyszyn, S. “Single-pole eight-throw rf MEMS rotary switch.” IEEE/ASME J. Microelectromech. Syst. 15:1735–1744, 2006. 44. Lin, L. Y., and Goldstein, E. L. “Opportunities and challenges for MEMS in lightwave communications.” IEEE J. Select. Topics Quantum Electron. 8:163–172, 2002. 45. Vaha-Heikkila, T., Van Caekenberghe, K., Varis, J., Tuovinen, J., and Rebeiz, G. M. “Rf MEMS impedance tuners for 6–24 GHz applications.” Wiley Int. J. RF Microwave Computer-Aided Engineering 17:265–278, 2007. 46. Schoebel, J., Buck, T., Reimann, M., Ulm, M., Schneider, M., Jourdain, A., Carchon, G. J., and Tilmans, H. A. C. “Design considerations and technology assessment of phased array antenna systems with rf MEMS for automotive radar applications.” IEEE Trans. Microwave Theory Tech. 53:1968–1975, 2005. 47. Wu, M. C., Solgaard, O., and Ford, J. E. “Optical MEMS for lightwave communication.” J. Ligtwave Technol. 24:4433–4454, 2006. 48. Mailloux, R. J. Phased Array Antenna Handbook. London: Artech House, 2005. 49. Hoffmann, M., and Voges, E. “Bulk silicon micromachining for MEMS in optical communication systems.” J. Micromech. Microeng. 12:349–360, 2002. 50. Jung, C., Lee, M., Li, G. P., and Flaviis, F. D. “Reconfigurable scan-beam singlearm spiral antenna integrated with rf MEMS switches.” IEEE Trans. Antennas Propagat. 54:455–463, 2006. 51. Premachandran, C. S., Chew, M., Choi, W., Khairyanto, A., Chen, K., Singh, J., Wang, S., Xu, Y., Chen, N., Sheppard, C., Olivo, M., and Lau, J. H. “Influence of optical probe packaging on a 3D MEMS scanning micro mirror for optical coherence tomography (OCT) applications.” In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 27–30, 2008, pp. 829–833. 52. Premachandran, C. S., Lau, J. H., Ling, X., Khairyanto, A., Chen, K., and Myo Ei Pa Pa. “A novel, wafer-level stacking method for low-chip yield and non-uniform, chip-size wafers for MEMS and 3D SiP applications. In IEEE Proceedings of Electronic Components and Technology Conference, Orlando, FL, May 27–30, 2008, pp. 314–318. 53. Lau, J. H. “3D MEMS packaging.” In IMAPS Proceedings, San Jose, CA, November 2009. 54. Chen, K., Premachandran, C., Choi, K., Ong, C., Ling, X., Ratmin, A., Pa, M., and Lau, J. H. “C2W low temperature bonding method for MEMS applictions.” In IEEE Proceedings of Electronics Packaging Technology Conference, Singapore, December 2008, pp. 1–7.

Tags: , , , , , , , , ,

One Response to “Part 3 of 3: Trends in advanced IC Packaging”

  1. [...] here to see the original: Part 3 of 3: Trends in advanced IC Packaging | Electronics Advocate Share and [...]

    #3316

Leave a Reply

LINKS

EA Blog

Most Popular

Recent posts

New Products

Email Newsletter icon, E-mail Newsletter icon, Email List icon, E-mail List icon Sign up for our Email Newsletter